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正型光阻劑
  負型光阻劑
  顯影劑
  蝕刻液/剝離液
  平坦化阻劑
  熱固化玻璃樹脂
  低介電研磨液/銅研磨液
  乾膜光阻
  黑色矩陣
  3D列印紫外線活化樹脂
   
   
  光引發劑 光敏劑
   
   
   
   
  旋轉塗佈機 
  Aligner(定位)曝光機 
  PH滴定儀 
  掃描電子顯微鏡(SEM) 
  光學顯微鏡(OM) 
  雷射共軛焦顯微鏡
  光學膜厚儀 
  ICP-MS感應耦合電漿質譜分析儀
   
   

   

   
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DLC is
Supplier of lithographic products including ultra-pure negative / positive photoresist and planarizing coating for the microelectronic, optoelectronic and graphic arts industries and other customer-specific specialty coatings


DLC provide a negative acting resist that is soluble in acetone and has an easy to use water soluble developer.  It's really a negative acting positive resist.  It is very easy to use.

光阻有幾個重要的技術參數:

解析度
resolution區別晶圓片表面相鄰圖形特徵的能力,一般用關鍵尺寸
CDCritical Dimension來衡量解析度。
對比度
Contrast指光阻從曝光區到非曝光區過渡的陡度。
敏感度
Sensitivity光阻上產生一個良好的圖形所需一定波長光的最小能量值(或最小曝光量)。
粘滯性/黏度
Viscosity是衡量光阻流動特性的參數。
粘附性
Adherence表徵光阻粘著於襯底的強度。
抗蝕性
Anti-etching光阻必須保持它的粘附性,在後續的刻蝕工序中保護襯底表面。
表面張力
Surface tension液體中將表面分子拉向液體主體內的分子間吸引力。
存儲和傳送
storage and transmission能量(光和熱)可以啟動光阻。應該存儲在密閉、低溫、不透光的盒中。同時必須規定光阻的閒置期限和存儲溫度環境。


旋寶好化學主營產品包括
IC photoresist , Packaging , LCP/TP phototresist , LED photoresist , Discrete Device , MEMS


正負型光阻質量皆通過 黏度檢測  >  水含量檢測  >    固含量檢測   >    UV吸收光譜儀   >    開黃光流程       
 

e-Beam Rresists
Negative Photoresists
Positive Photoresists
Silylation Process
Edge Bead Removers
Metal Lift-off 
Resist Developers
Resist Removers
Planarizing Coatings
Spin-On Glass Coatings (SOG)
Spin-On Dopants
Anti-Reflective Coatings
Nanoimprint Lithography, NIL
Photosensitive Polyimides (PSPI)
Microfluidics PDMS
hexamethyldisilazane (HMDS)
Etch Rates For Micromachining Processing II (nm/min)

 
 
Miniaturization of CMOS
Low-temperature back-end-of-line technology compatible with III-V nanowire MOSFETs
Micro-light-emitting diodes with quantum dots in display technology
Introduction To Semiconductor Manufacturing Technology
製程中使用四道光罩,平臺隔離 mesa isolation;歐姆接觸 ohmic contact ;閘級 gate contact ; 鈍化 passivation

Micromachining Processes
奈米液滴壓電致動產生器—製程、組裝與測試之研究
Silicon Nanowire Field-effect Chemical Sensor
Microfluidics as a tool for C. elegans research

Engineering metallic nanostructures for plasmonics and nanophotonics
EUV resist: the great challenge of small things
30 years of microfluidics
以微流道為例探討不同製程方式之研究
Absorbance Modulation Optical Lithography
Instituto de Energia Solar1 – Universidad Politecnica de Madrid – Negative Resist Research – Summer 2003
A novel self-assembled and maskless technique for highly uniform arrays of nanon holes and nano-pillars

Etch Rates For Micromachining Processing

Topside anti-reflective coating process and productivity improvements on KrF lithography



If you don't find what you're looking for, Contact Us. We may have a suitable product that's not listed, or we may be able to develop a material to fit your specific needs. Tel : (02)2217-3442 / Fax : (02)2704-4070

 

 

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