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正型光阻劑
  負型光阻劑
  顯影劑
  蝕刻液/剝離液
  平坦化阻劑
  熱固化玻璃樹脂
  低介電研磨液/銅研磨液
  乾膜光阻
  黑色矩陣
  3D列印紫外線活化樹脂
   
   
  光引發劑 光敏劑
   
   
   
   
   
   
   
   
   
   
   

   

   
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XBH
is
Supplier of lithographic products including ultra-pure negative / positive photoresist and planarizing coating for the microelectronic, optoelectronic and graphic arts industries and other customer-specific specialty coatings


XBH provide a negative acting resist that is soluble in acetone and has an easy to use water soluble developer.  It's really a negative acting positive resist.  It is very easy to use.

 

Electro-Deposited Photoresist
Negative Photoresists
Positive Photoresists
Silylation Process
Edge Bead Removers
Lift-off resist
Resist Developers
Resist Removers
Planarizing Coatings
Spin-On Glass Coatings
Spin-On Dopants
Nanoimprint Lithography, NIL
Photosensitive Polyimides (PSPI)
Microfluidics PDMS
hexamethyldisilazane (HMDS)
Etch Rates For Micromachining Processing II (nm/min)

 
 

Absorbance Modulation Optical Lithography

Instituto de Energia Solar1 – Universidad Politecnica de Madrid – Negative Resist Research – Summer 2003
A novel self-assembled and maskless technique for highly uniform arrays of nanon holes and nano-pillars

Etch Rates For Micromachining Processing



If you don't find what you're looking for, Contact Us. We may have a suitable product that's not listed, or we may be able to develop a material to fit your specific needs. Tel : (02)2217-3442 / Fax : (02)2704-4070

 

 

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