氯化鐵（Ferric
Chloride），鹼性氨（Alkaline
Ammonia），硫酸加過氧化氫（Sulfuric
Acid + Hydrogen Peroxide），和氯化銅（Cupric
Chloride）NMP
酸性溶液：
氫氟酸(HF)蝕刻SiO2及石英洗淨
雙氧水(H2O2)
使用於矽氧化，清除微塵
硫酸(H2SO4)
搭配雙氧水去除有機物，比率
硫酸/雙氧水7/3
鹽酸(HCL)
搭配雙氧水去除晶圓上重金屬
BOE(HF+NH4F)
緩衝氧化層蝕刻劑，
SiO2薄膜蝕刻
磷酸(H3PO4)
氯化矽蝕刻
硝酸(HNO3)
混合氫氟酸，蝕刻磷矽玻璃(PSG)
鹼性溶液：
氨水(NH4OH)
清除微塵
高純潔淨水(DIW)沖洗晶圓及稀釋化學溶液
異丙醇(IPA)晶圓蝕刻洗淨及輔助乾燥
RR系列的設計能夠有效且迅速地去除正及負型光阻劑，不會對鋁、鋁合金、鉻、鎳、銅等金屬造成腐蝕現象。不含苯酚及氯化物溶劑，可降低對人體及環境的不良影響。
RR光阻剝除劑能迅速有效地剝除正及負型光阻劑，廣泛應用於半導體、發光二極體、光罩板、印刷電路板產業。
有效去除陶瓷封裝上環氧樹脂的油墨，玻璃器皿上的油脂及有機物質，分解晶圓的殘留蠟。
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Solvent-based resist
removers |
|
Applications |
Solvent-based resist removers are compatible
with metals and oxides applied in electronic and opto-electronic device
fabrication. Solvents utilized in resist remover formulations present
low hazard in industrial applications. |
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Water-based resist removers |
|
Applications |
Water based resist removers are compatible
with gold, platinum and copper. |
Megasonics
Agitation Allows Removal of Chemically Amplified Photo-resists
If you don't find what you're looking for,
Contact Us.
We may have a suitable product that's not listed, or we may be
able to develop a material to fit your specific needs.
Tel : (02)2217-3442 / Fax : (02)2704-4070
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