廠商登入區員工登入區學術研究機構登入區    
 
  
 

193nm深紫外光光阻劑

 

含矽光阻劑
  低介電研磨液/銅研磨液
  水性光阻劑
  正型光阻劑
  負型光阻劑
  顯影劑
  蝕刻液
  平坦化阻劑
  熱固化玻璃樹脂
   
   
   
   
   
   
   
   
   
   
   
   
   
   
   

   

   
 
 
 
HMDS(hexamethyldisilazane, (CH3)3SiNHSi(CH) 改變晶圓表面的極性,含 Si一端 (無機端) 與晶圓表面的矽醇基進行化學反應,形成 -Si-O-Si- 鍵結,並使晶圓表面由親水性(Si-OH) 變成疏水性 (Si-CH3); CH3的一端(有機端) 與阻劑中 C、H、O 等分子團產生較強的作用力,進而增加阻劑與晶圓表面的附著力


Surface modification

利用共價鍵結在材料表面形成一單分子層monolayer的化學分子,以改變原來材料的表面特性。使用於生醫應用的方面,主要兩類化學方法, 一是對矽基質的siloxane另一則是對金的thiol方法。利用hexamethyldisilazane HMDS來披覆一層emthyl(CH3)稱為methylating the surface增加光阻劑與其他表面的貼附。

 

HMDS [(CH3)3Si]2NH
去除SiO2表面的OH group
2SiOH + [(CH3)3Si]2NH -> 2SiOSi(CH3)3 {bound to surface} + NH3     
去除SiO2表面的水分   H2O + [(CH3)3Si]2NH -> [(CH3)3Si]2O + NH3

此程序可以用來附著相當多不同的分子到矽的表面,包括蛋白質與基因,另外亦可於金的表面形成thiol來進行


H
MDS半導體廠常用之脫水劑,用以塗附於矽晶片上與表面水蒸氣反應,並改變晶片表面特性由親水性變為親油性,以利光阻之塗蓋,增加光阻之附著力





Improved adhesion of novolac and epoxy based resists by cationic organic materials on critical substrates for high volume patterning applications

Fabrication of transparent polysiloxane coatings on a glass support via the sol-gel dip coating technique and the effect of their hydrophobization with hexamethyldisilazane
Surface Tension and Adhesion of Photo and Electron-Beam Resists
Fabrication and testing of surface ratchets primed with hydrophobic parylene and hexamethyldisilazane for transporting droplets
Amplified Spontaneous Emission Threshold Reduction and Operational Stability Improvement in CsPbBr3 Nanocrystals Films by Hydrophobic Functionalization of the Substrate
On Antireflective Coatings with Stable Hydrophobicity for Solar Tube
Partial or total silylation of dextran with hexamethyldisilazane

 


If you don't find what you're looking for, Contact Us. We may have a suitable product that's not listed, or we may be able to develop a material to fit your specific needs. Tel : (02)2217-3442 / Fax : (02)2704-4070
 

 

 

  Copyright and Disclaimerc © David Lu & Corp.