廠商登入區員工登入區學術研究機構登入區    
 

  
 

 

正型光阻劑

 

負型光阻劑
  提高光阻烘烤溫度

 

光阻洗邊液

平坦化阻劑
  Spin-On Glass
  Spin-On Dopants
  顯影液
  光阻剝離液
 

高透明度聚硫亞氨光阻

   
   
   
   
   
   
   
   
   
   
   
   
   
   

   

   
 
 
 
PC3 Coatings
Applications: 1 Planarizing Layer - etchback process to transfer planarity from planarizing layer into underlying dielectric. 2 Protective Coating - dicing and sawing operations to prevent mechanical damage to the fabricated device. 3 Adhesive Layer – attaching the device side of the wafer to a wafer holder in back grinding operations.

Properties: Superb planarizing capability.
Thickness range: 0.5-20 µm
Impact on productivity:



For Planarization Applications: Elimination of Chemical Mechanical Polishing (CMP) in some applications.
2 Suppression of microloading effects in etchback process.

For Protective Coating Applications: Elimination of film peeling and cracking during dicing operations.

For Adhesive Applications:
1 Easy removal in Resist Developer RD3 or RD6 after back grinding and wafer separation. 2
Elimination of waxes from backside processing.

PC3 Coatings  Coating Thickness
PC3-700 0.6µm - 1.6µm
PC3-1500 1.1µm - 3.2µm
PC3-6000 5.0µm - 12.2µm

 

Planarizing Coatings for Sacrificial Etchback Applications
Thickness Range 0.7 - 12 µm
Performance Superior planarizing capability.

Outstanding etchback compatibility with underlying dielectric.

Applications Surface planarization for planarization etchback process.
Protective coating.
Binding layer on the active side of devices for backgrinding.
Protective coating in wafer dicing.

Development of novel UV cross-linkable materials for enhancing planarity in via applications via the correlation of simulated and experimental analyses
Beam Lead Quartz Chips for Superconducting Millimeter-Wave Circuits



If you don't find what you're looking for, Contact Us. We may have a suitable product that's not listed, or we may be able to develop a material to fit your specific needs. Tel : (02)2217-3442 / Fax : (02)2704-4070
 

 

 

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