LIGA resist
是在PMMA基礎上開發的厚膜光阻,其中PMMA的分子量為410K。另外,可以根據客戶的具體需求來生產其他分子量的LIGA製程光阻。主要用於LIGA製程和X-Ray
曝光製程。厚度從10~250µm不等,圖形剖面垂直。
The resists of series LIGA 10.12 - 19 are positive resists on a
PMMA-base to produce thicker PMMA layers. They are designed for
applications in LIGA technique and mask production in x-ray
lithography. The image of the structures is excellent with
absolutely vertical resist flanks. PMMA resists have a good
adhesion on titan oxide. Film thickness from 10 - 250 µm can be
realised. Resist layers can be developed in safer solvents. The
resist consists of high molecular polymethyl methacrylate (PMMA)
in a safer-solvent with main components propylene glycol methyl
ether acetate.
穿戴式應用添柴薪 MEMS感測器需求增溫![](icoLeaf.gif)
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