3" 4H N-Type SiC Epi-ready Substrates
3” 4H Semi-Insulating SiC Epi-ready Substrate
2” 4H N-Type SiC Epi-ready Substrate
2” 6H Semi-Insulating SiC Epi-ready Substrate
2” 6H N-Type SiC Epi-ready Substrate |
Wafer
Diameter : 34.9 ± 0.25
mm
50.8 ± 0.25 mm
Edge
Exclusion :
<5
mm (for 50.8 mm diameter)
Wafer
Thickness : 300 ± 25 µm
Micropipe
Density :
<100 cm-2
Etch Pit
Density
(on Si face) :
<104
cm-2
Dopant : Nitrogen
Net Dopant
Concentration :
1-3 x
1018
cm-3
Conductivity : n-type
Resistivity : 0.04 ohm cm ±
factor of 2
Surface
Finish : Si face
polished
Polytype
Homogeneity :
>95%
Orientation : On-axis:
<0001> ± 0.5°
Off-axis:
<0001>
8° off towards <1100>
or <1120>
Crystal
Structure : Hexagonal
Bandgap : 3.2 eV
Thermal
Conductivity :
4.9 Wcm-1
K-1
Mohs
Hardness : ~9.5 |