Applied MicroStructures MVD system deposits at
room temperature a molecular or “atomic layer” organic film
which permanently modifies the surfaces of virtually any
In MEMS, these surface coatings reduce the work of adhesion
and greatly reduce stiction (Displays, Moving Mirrors,
Actuators, Resonators, Sensor protection).
For BioMEMS, these surface coatings can be used to change
the wetting properties of materials, i.e., they are tunable
from hydrophobic to hydrophilic (for Micro-fluidic Channels,
Micro -Nozzles, etc.). Additionally, films with functional
ends can be deposited in which new molecules can be created
and synthesized for new nano-development projects.
these monolayer coatings are used as
anti-stick “release-layers” or transfer layers.
For Medical Devices, wetting or anti-fouling films can be
deposited on virtually any material.
packaging applications, MVD creates an ultra-thin
hydrophobic moisture barrier.
Applied MicroStructures has developed a low cost, all dry,
process tool for the vapor deposition of various molecular
films. MVD is sometimes referred to as VSAMS or vapor
self-assembled monolayers. However, in MVD, one can expand a
vapor SAM to include several layers or co-deposited molecular
films. For example, in MVD, one can deposit one layer on top
of a previous layer using different precursors. This opens up
the possibilities of the ultra-thin organic vapor coatings to
new regimes. We can handle a variety of substrates including
semiconductors, metals, polymers, plastics, glass and many
The advantages of MVD for nano-coatings are tremendous when
compared to the traditional application
technique of liquid-phase immersion. Since many of the nano-precursors
used are moisture-sensitive, the liquid phase coating
technique is prone to particle formation and is dependent on
atmospheric conditions. It is also very expensive. Applied
MicroStructures has eliminated all of these problems with a
sub-atmospheric process in a patented vapor delivery system.
We have also integrated a plasma treatment which is used to
clean and prepare the surfaces prior to the deposition
In the nano regime, MVD is the ideal method to deposit your
coatings. Another way to interpret the MVD process is that it
is similar to ALD (atomic layer deposition) of long chain
organic molecules. What is unique about MVD, is that process
is self-limiting. During the deposition, only one layer of the
molecular thickness is formed. In a properly controlled
process, you cannot deposit a film which is too thick or
non-uniform. However, with special process tricks which have
been patented by Applied MicroStructures, it is now possible
to deposit sandwich layers of the molecular films.
applications, we have depositing a layered structure
of ((fluorocarbon + oxide) x multiple repeat sandwich). This
multi-sequence layer structure could be a moisture and oxygen
Applied Micro Structures MVD 100
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Tel : (02)2217-3442 / Fax : (02)2704-4070