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分子沉積系統提供了一種超薄薄膜沉積的革新方法,該方法可以在室溫下完成各種有機物、有機金屬的分子層沉積。區別于傳統的液態合成物沉積技術,MVD分子沉積技術對改變表面材料的特性更加理想,由此帶動了諸多領域的廣泛應用。例如:納米結構的抗粘處理、疏水性、親水性處理、生物相容性、保護層、反應層技術等。

Applied MicroStructures MVD system deposits at room temperature a molecular or “atomic layer” organic film which permanently modifies the surfaces of virtually any material.

In MEMS, these surface coatings reduce the work of adhesion and greatly reduce stiction (Displays, Moving Mirrors, Actuators, Resonators, Sensor protection).
For BioMEMS, these surface coatings can be used to change the wetting properties of materials, i.e., they are tunable from hydrophobic to hydrophilic (for Micro-fluidic Channels, Micro -Nozzles, etc.). Additionally, films with functional ends can be deposited in which new molecules can be created and synthesized for new nano-development projects.
In Nano-Lithography, these monolayer coatings are used as anti-stick “release-layers” or transfer layers.
For Medical Devices, wetting or anti-fouling films can be deposited on virtually any material.
In packaging applications, MVD creates an ultra-thin hydrophobic moisture barrier.

Applied MicroStructures has developed a low cost, all dry, process tool for the vapor deposition of various molecular films. MVD is sometimes referred to as VSAMS or vapor self-assembled monolayers. However, in MVD, one can expand a vapor SAM to include several layers or co-deposited molecular films. For example, in MVD, one can deposit one layer on top of a previous layer using different precursors. This opens up the possibilities of the ultra-thin organic vapor coatings to new regimes. We can handle a variety of substrates including semiconductors, metals, polymers, plastics, glass and many others.

The advantages of MVD for nano-coatings are tremendous when compared to the traditional application technique of liquid-phase immersion. Since many of the nano-precursors used are moisture-sensitive, the liquid phase coating technique is prone to particle formation and is dependent on atmospheric conditions. It is also very expensive. Applied MicroStructures has eliminated all of these problems with a sub-atmospheric process in a patented vapor delivery system. We have also integrated a plasma treatment which is used to clean and prepare the surfaces prior to the deposition process.

In the nano regime, MVD is the ideal method to deposit your coatings. Another way to interpret the MVD process is that it is similar to ALD (atomic layer deposition) of long chain organic molecules. What is unique about MVD, is that process is self-limiting. During the deposition, only one layer of the molecular thickness is formed. In a properly controlled process, you cannot deposit a film which is too thick or non-uniform. However, with special process tricks which have been patented by Applied MicroStructures, it is now possible to deposit sandwich layers of the molecular films.
For OLED applications, we have depositing a layered structure of ((fluorocarbon + oxide) x multiple repeat sandwich). This multi-sequence layer structure could be a moisture and oxygen barrier.


Applied Micro Structures MVD 100 Operating Manual



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